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由上下电极覆盖的铁电薄膜中最小180度电畴尺寸

陈永秋 刘玉岚 王彪

陈永秋, 刘玉岚, 王彪. 由上下电极覆盖的铁电薄膜中最小180度电畴尺寸[J]. 应用数学和力学, 2006, 27(8): 899-903.
引用本文: 陈永秋, 刘玉岚, 王彪. 由上下电极覆盖的铁电薄膜中最小180度电畴尺寸[J]. 应用数学和力学, 2006, 27(8): 899-903.
CHEN Yong-qiu, LIU Yu-lan, WANG Biao. Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes[J]. Applied Mathematics and Mechanics, 2006, 27(8): 899-903.
Citation: CHEN Yong-qiu, LIU Yu-lan, WANG Biao. Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes[J]. Applied Mathematics and Mechanics, 2006, 27(8): 899-903.

由上下电极覆盖的铁电薄膜中最小180度电畴尺寸

基金项目: 国家自然科学基金资助项目(50232030;10172030;10572155)
详细信息
    作者简介:

    陈永秋(1963- ),男,黑龙江人,副教授;刘玉岚(1962- ),女,吉林人,博士,教授(联系人.Tel:+86-20-84110006;Fax:+86-20-84115692;E-mail:stslyl@zsu.edu.cn);王彪(1963- ),男,辽宁人,博士,教授.

  • 中图分类号: O322

Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes

  • 摘要: 在较低的电压下,铁电畴发生反转的性能对于研发高密度铁电存储器是至关重要的.为了实现高密度存储,铁电畴必须做得愈小愈好.然而,当外加电场撤去后,很小的铁电畴是不稳定的,会发生缩小,直致消失,导致存储的信息消失.为解决此问题,发展了一种通用的方法用于决定避免反向反转的铁电畴的尺寸.做为一个例子,确定了由上下电极覆盖的铁电薄膜中最小180度电畴尺寸.该研究可以用于许多相似的问题.
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出版历程
  • 收稿日期:  2005-06-07
  • 修回日期:  2006-04-30
  • 刊出日期:  2006-08-15

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